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Diffusion Processes And Interface Electron Scattering In Film Systems Based On Cu/Fe AND Fe/Cr

Author(s): O.V. Synashenko | A.I. Saltykova | I.Yu. Protsenko

Journal: Journal of Nano- and Electronic Physics
ISSN 2077-6772

Volume: 1;
Issue: 2;
Start page: 79;
Date: 2009;
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Keywords: Diffusion Profile | Sims | Diffusion Coefficient | Interface Roughness | Interface Transmission Coefficient

Investigation results of diffusion processes by the SIMS and the AES methods in Cu/Fe and Fe/Cr film systems are represented; influence of the annealing temperature on the effective thermal diffusion coefficients is studied. Values of the interface transmission coefficient and the effective diffusion coefficients in different processes, namely, the condensation-stimulate diffusion, the ion-stimulate one, and the thermal diffusion, are calculated.
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