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Effect of Impurity Concentration on the Depth Profile of the Electric Field within Monolayer Thin Film

Author(s): N.F. Habubi | Kh.A. Mishjil | H.G. Rashid

Journal: Journal of Nano- and Electronic Physics
ISSN 2077-6772

Volume: 4;
Issue: 2;
Start page: 02024-1;
Date: 2012;
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Keywords: Electric field intensity | Matrix formulas | Contamination sensitivit

The effect of impurity concentration ratios on the depth profile of electric field within monolayer film is presented. SnO2 monolayer thin film material was prepared and doped with Co using spray chemical pyrolysis. The concentration ratios of impurity were 1 %, 3 %, 5 % and 7 %. The analysis utilizes matrix formulas based on Abele's formulas from the calculation of reflectance and transmittance. Present study gives an information to contamination sensitivity in optical coating issue.
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