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Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

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Author(s): Sahoo KartikaChandra | Lin Men-Ku | Chang Edward-Yi | Lu Yi-Yao | Chen Chun-Chi | Huang Jin-Hua | Chang Chun-Wei

Journal: Nanoscale Research Letters
ISSN 1931-7573

Volume: 4;
Issue: 7;
Start page: 680;
Date: 2009;
Original page

Keywords: Sub-wavelength Structure | Solar cell | SWS fabrication | Reflectance | Anti-reflective coatings

ABSTRACT
Abstract We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.
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