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Femtosecond laser-induced damage in dielectrics

Author(s): ufeng Peng | Yaoli Wei | Zhenlong Lv

Journal: Optica Applicata
ISSN 0078-5466

Volume: 34;
Issue: 3;
Start page: 319;
Date: 2004;
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Keywords: femtosecond laser | ablation mechanism | damage threshold | electron number density

We present a new method to investigate the ablation phenomenon by a 100 fs, 1053 nm Gaussian laser pulse in fused silica and describe the different mechanisms of ablation in long pulse and ultrashort pulse lasers. A modified rate equation is used to numerically calculate damage in dielectrics. In addition, we examine the respective role of ionization and avalanche ionization in femtosecond laser-induced damage. We find that present results are in quantitative agreement with those of earlier study.

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