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Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties

Author(s): Е.I. Zubko

Journal: Journal of Nano- and Electronic Physics
ISSN 2077-6772

Volume: 4;
Issue: 2;
Start page: 02036-1;
Date: 2012;
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Keywords: Porous silicon | Modification | Photoanodizing | Reflectio

Transmission and reflection spectra, refraction factor of the porous silicon layers produced in HF(48%): HCl:H2O and HF(48%):HBr:H2O solutions are investigated by the sample illumination and without it. It is established that layers produced by electrolytic anodizing in HF(48%):HBr:H2O = 16:2:80 mass% solution have the best antireflective characteristics and smaller optical transmission than other samples.
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