Academic Journals Database
Disseminating quality controlled scientific knowledge

Impact of the Stress on the Sub-Micron N-Metal Oxide Semiconductor Field Effect Transistor Characteristics

ADD TO MY LIST
 
Author(s): R. Marrakh | A. Bouhdada

Journal: Active and Passive Electronic Components
ISSN 0882-7516

Volume: 24;
Issue: 3;
Start page: 187;
Date: 2001;
Original page

Keywords: Hot-carrier-injection | Stress time | Drain current | Transconductance | MOSFET.
Save time & money - Smart Internet Solutions      Why do you need a reservation system?