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Influence of Averaging of Energy of the Sputtered Atoms on Quasiequilibrium Steady-State Condensation

Author(s): A.A. Mokrenko | V.I. Perekrestov | Yu.O. Kosminska

Journal: Journal of Nano- and Electronic Physics
ISSN 2077-6772

Volume: 2;
Issue: 3;
Date: 2010;
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Keywords: Quasi-Equilibrium Condensation | Plasma | Thermodynamic Equilibrium | Magnetron Sputtering | Supersaturation

In this paper it is shown, that result of the quasi-equilibrium condensation in accumulative plasma-condensate system depends on the stability of the technological process, which in the general case is determined by the steadiness of the supersaturation, morphology and crystallographic structure of the growth surface and also by the energy dispersion of sputtered atoms. The effect of energy averaging of sputtered atoms moving in high-pressure plasma has been established using the Monte-Carlo simulation. Results of the experimental investigation of the aluminum condensate formation near the thermodynamic equilibrium have shown that the increase in the working gas pressure more than 2.4 Pa leads to the decrease in the film dispersity. This fact confirms the stability of the process.
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