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The Influences of H2Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition

Author(s): Jian Sheng-Rui | Chen Yuan-Tsung | Wang Chih-Feng | Wen Hua-Chiang | Chiu Wei-Ming | Yang Chu-Shou

Journal: Nanoscale Research Letters
ISSN 1931-7573

Volume: 3;
Issue: 6;
Start page: 230;
Date: 2008;
Original page

Keywords: Multiwalled carbon nanotubes | H2pretreatment | Raman spectroscopy | Scanning electron microscopy | Transmission electron microscopy

AbstractThe effects of H2flow rate during plasma pretreatment on synthesizing the multiwalled carbon nanotubes (MWCNTs) by using the microwave plasma chemical vapor deposition are investigated in this study. A H2and CH4gas mixture with a 9:1 ratio was used as a precursor for the synthesis of MWCNT on Ni-coated TaN/Si(100) substrates. The structure and composition of Ni catalyst nanoparticles were investigated using scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The present findings showed that denser Ni catalyst nanoparticles and more vertically aligned MWCNTs could be effectively achieved at higher flow rates. From Raman results, we found that the intensity ratio of G and D bands (ID/IG) decreases with an increasing flow rate. In addition, TEM results suggest that H2plasma pretreatment can effectively reduce the amorphous carbon and carbonaceous particles. As a result, the pretreatment plays a crucial role in modifying the obtained MWCNTs structures.
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