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Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target

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Author(s): R. RAKOWSKI | A. BARTNIK | H. FIEDOROWICZ | R. JAROCKI | J. KOSTECKI | J. KRZYWINSKI | J. MIKOLAJCZYK | L. PINA | L. RYC | M. SZCZUREK | H. TICHA | P. WACHULAK

Journal: Optica Applicata
ISSN 0078-5466

Volume: 36;
Issue: 4;
Start page: 593;
Date: 2006;
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Keywords: laser-produced plasma extreme ultraviolet (EUV) source | gas puff target | Mo/Si mirrors | EUV spectroscopy

ABSTRACT
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The source is based on an xenon-helium double-stream gas puff target irradiated with laser pulses from a Nd : YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry.
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Tango Jona
Tangokurs Rapperswil-Jona