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Preliminary Study of Nanomarks Fabrication for Nanomultilayers Alignment using Scanning Electron Microscopy

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Author(s): Uda Hashim | Sutikno Madnasri | Zul Azhar Zahid Jamal

Journal: Jurnal Nanosains & Nanoteknologi
ISSN 1979-0880

Volume: 1;
Issue: 2;
Start page: 58;
Date: 2008;
Original page

Keywords: Platinum etch | inductively coupled plasma | mark | alignment

ABSTRACT
This paper explains about fabrication technique of mark, selection of mark materials, platinum (Pt) deposition using sputtering, Pt etching using ICP system, and alignment technique. Many researchers made nano-alignment using mask aligner for photolithography with marks dimensions in micron up to millimeters. In this research, we try to develop the smaller marks using SEM-based-lithography only. In this research, materials selection step for mark is completely explained. Literatures study on nano-mark fabrication is made to explore various fabrication techniques of marks those are already previously published.
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