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Preliminary Study of Nanomarks Fabrication for Nanomultilayers Alignment using Scanning Electron Microscopy

Author(s): Uda Hashim | Sutikno Madnasri | Zul Azhar Zahid Jamal

Journal: Jurnal Nanosains & Nanoteknologi
ISSN 1979-0880

Volume: 1;
Issue: 2;
Start page: 58;
Date: 2008;
Original page

Keywords: Platinum etch | inductively coupled plasma | mark | alignment

This paper explains about fabrication technique of mark, selection of mark materials, platinum (Pt) deposition using sputtering, Pt etching using ICP system, and alignment technique. Many researchers made nano-alignment using mask aligner for photolithography with marks dimensions in micron up to millimeters. In this research, we try to develop the smaller marks using SEM-based-lithography only. In this research, materials selection step for mark is completely explained. Literatures study on nano-mark fabrication is made to explore various fabrication techniques of marks those are already previously published.
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