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Preparation of Nano-scaledTiO2-xNx Photocatalyst by PEALD in-situ Doping

Author(s): RAO Zhi-Peng, WAN Jun, FENG Jia-Heng, LI Chao-Bo, XIA Yang

Journal: Journal of Inorganic Materials
ISSN 1000-324X

Volume: 28;
Issue: 7;
Start page: 691;
Date: 2013;
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Keywords: PEALD; in-situ;TiO2-xNx; photocatalyst

TiO2-xNx photocatalyst was deposited by plasma-enhanced atomic layer deposition (PEALD) system using in-situ doping method. X-ray photoelectron spectroscope (XPS), high-resolution transmission electron microscope (HRTEM), photoluminescence (PL), UV-Vis spectra were used to characterize the photocatalyst, and the variation of water contact angles and photocatalytic decomposition property ofTiO2-xNx nano films to methylene orange (MO) solution under visible light were investigated. The results show that the incorporated nitrogen structures could be adjusted by plasma powers, and substitutional atoms are mainly formed in the TiO2 films deposited at the plasma power of 50 W, which is about ~1.22at%. The crystal type is anatase (101). No defect is observed in theTiO2-xNx films, and the recombination rate of the photo-generated electron-hole pairs is lower, which is conducive to the improvement of the photocatalytic efficiency. This method solves the problem of the formation of oxygen vacancies in the classic ALD growth process to prepare TiO2-xNx photocatalysts and theTiO2-xNx nano films realize visible absorption and visible light photocatalytic activity under visible light irradiation (λ

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