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Surface Morphological and Nanomechanical Properties of PLD-Derived ZnO Thin Films

Author(s): Jian Sheng-Rui | Teng I-Ju | Yang Ping-Feng | Lai Yi-Shao | Lu Jian-Ming | Chang Jee-Gong | Ju Shin-Pon

Journal: Nanoscale Research Letters
ISSN 1931-7573

Volume: 3;
Issue: 5;
Start page: 186;
Date: 2008;
Original page

Keywords: ZnO | PLD | AFM | Nanoindentation | Nanoscratch | Hardness

AbstractThis study reports the surface roughness and nanomechanical characteristics of ZnO thin films deposited on the various substrates, obtained by means of atomic force microscopy (AFM), nanoindentation and nanoscratch techniques. ZnO thin films are deposited on (a- and c-axis) sapphires and (0001) 6H-SiC substrates by using the pulsed-laser depositions (PLD) system. Continuous stiffness measurements (CSM) technique is used in the nanoindentation tests to determine the hardness and Young’s modulus of ZnO thin films. The importance of the ratio (H/Efilm) of elastic to plastic deformation during nanoindentation of ZnO thin films on their behaviors in contact-induced damage during fabrication of ZnO-based devices is considered. In addition, the friction coefficient of ZnO thin films is also presented here.

Tango Jona
Tangokurs Rapperswil-Jona

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