Author(s): Silva Maria Margareth da | Ueda Mário | Otani Choyu | Reuther Helfried | Lepienski Carlos Maurício | Soares Junior Paulo César | Otubo Jorge
Journal: Materials Research
ISSN 1516-1439
Volume: 9;
Issue: 1;
Start page: 97;
Date: 2006;
Original page
Keywords: Ti6Al4V | Plasma Nitriding | Plasma Immersion Ion Implantation | mechanical properties
ABSTRACT
Based on the fact that the Ti-6Al-4V alloy has good mechanical properties, excellent resistance to corrosion and also excellent biocompatibility, however with low wear resistance, this work aims to test plasma processes or combination of plasma and ion implantation processes to improve these characteristics. Two types of processing were used: two steps PIII (Plasma Immersion Ion Implantation) combined with PN (Plasma Nitriding) and single step PIII treatment. According to Auger Electron Spectroscopy (AES) results, the best solution was obtained by PIII for 150 minutes resulting in ~ 65 nm of nitrogen implanted layer, while the sample treated with PIII (75 minutes) and PN (75 minutes) reached ~ 35 nm implanted layer. The improvement of surface properties could also be confirmed by the nanoindentation technique, with values of hardness increasing for both processes. AFM (Atomic Force Microscopy) characterization showed that the single step PIII process presented greater efficiency than the duplex process (PIII + PN), probably due to the sputtering occurring during the second step (PN) removing partially the implanted layer of first step (PIII).
Journal: Materials Research
ISSN 1516-1439
Volume: 9;
Issue: 1;
Start page: 97;
Date: 2006;
Original page
Keywords: Ti6Al4V | Plasma Nitriding | Plasma Immersion Ion Implantation | mechanical properties
ABSTRACT
Based on the fact that the Ti-6Al-4V alloy has good mechanical properties, excellent resistance to corrosion and also excellent biocompatibility, however with low wear resistance, this work aims to test plasma processes or combination of plasma and ion implantation processes to improve these characteristics. Two types of processing were used: two steps PIII (Plasma Immersion Ion Implantation) combined with PN (Plasma Nitriding) and single step PIII treatment. According to Auger Electron Spectroscopy (AES) results, the best solution was obtained by PIII for 150 minutes resulting in ~ 65 nm of nitrogen implanted layer, while the sample treated with PIII (75 minutes) and PN (75 minutes) reached ~ 35 nm implanted layer. The improvement of surface properties could also be confirmed by the nanoindentation technique, with values of hardness increasing for both processes. AFM (Atomic Force Microscopy) characterization showed that the single step PIII process presented greater efficiency than the duplex process (PIII + PN), probably due to the sputtering occurring during the second step (PN) removing partially the implanted layer of first step (PIII).
