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Photoinduced reorientation and polarization holography in a new photopolymer with 4-methoxy-N-benzylideneaniline side groups

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Author(s): Nobuhiro Kawatsuki | Hitomi Matsushita | Mizuho Kondo | Tomoyuki Sasaki | Hiroshi Ono

Journal: APL Materials
ISSN 2166-532X

Volume: 1;
Issue: 2;
Start page: 022103;
Date: 2013;
Original page

ABSTRACT
The photoinduced reorientation and surface relief (SR) formation behaviors of a novel photosensitive polymer, which was transparent in visible region, were investigated using linearly polarized-313-nm light and holographic exposure with a 325-nm He-Cd laser. The polymer was comprised of photosensitive 4-methoxy-N-benzylideneaniline side groups, and exhibited a sufficient photoinduced molecular reorientation with a birefringence of 0.11. Holographic exposure generated a SR structure, which had a periodical molecular reorientation that depended on the polarization of the interference beams. The generated SR height was ∼212 nm, and the inscription of a double holographic exposure yielded a two-dimensional SR structure.
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