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Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies

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Author(s): Sean W. King | Harsono Simka | Dan Herr | Hiro Akinaga | Mike Garner

Journal: APL Materials
ISSN 2166-532X

Volume: 1;
Issue: 4;
Start page: 040701;
Date: 2013;
Original page

ABSTRACT
Recent discussions concerning the continuation of Moore's law have focused on announcements by several major corporations to transition from traditional 2D planar to new 3D multi-gate field effect transistor devices. However, the growth and progression of the semiconductor microelectronics industry over the previous 4 decades has been largely driven by combined advances in new materials, lithography, and materials related process technologies. Looking forward, it is therefore anticipated that new materials and materials technologies will continue to play a significant role in both the pursuit of Moore's law and the evolution of the industry. In this research update, we discuss and illustrate some of the required and anticipated materials innovations that could potentially lead to the continuation of Moore's law for another decade (or more). We focus primarily on the innovations needed to achieve single digit nanometer technologies and illustrate how at these dimensions not only new materials but new metrologies and computational modeling will be needed.
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