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Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Author(s): Luis Guillermo Villanueva | Oscar Vazquez-Mena | Cristina Martin-Olmos | Veronica Savu | Katrin Sidler | Juergen Brugger

Journal: Micromachines
ISSN 2072-666X

Volume: 4;
Issue: 4;
Start page: 370;
Date: 2013;
Original page

Keywords: nanostencil lithography | nanoimprint lithography | nanowires

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.
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RPA Switzerland

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Tango Rapperswil
Tango Rapperswil